TRUMPF, a manufacturer of laser diodes made from Gallium Arsenide substrates (GaAs) wafers, needed a practical, cost-effective wafer-thinning wastewater treatment process that would also allow them to meet local regulatory discharge requirements. To better understand the effects of the different treatment stages on arsenic within the wastewater management system, TRUMPF installed the MetalGuard™ Arsenic online arsenic analyzer to measure influent and effluent arsenic levels in real time. The MetalGuard analyzer provided TRUMPF with accurate and reliable results to measure the performance of its IEX system and ensure regulatory compliance. The wastewater treatment approach that TRUMPF introduced resulted in several process improvements, providing an estimated annual cost savings of more than $150K with an ROI of less than one year.

In this engaging interview from WEFTEC 2024, Rick Bacon, CEO of AMS, joins Paul Gagliardo, Innovation Director of The Water Entrepreneur Podcast, to discuss the pressing challenges of treating difficult-to-remove contaminants, with a particular focus on PFAS. Throughout their conversation, Rick shares his insights on the prevalence of PFAS discussions at the conference and highlights the complexities faced by consumers when choosing between various treatment technologies—whether extraction, absorption, or destruction. He emphasizes the need for comprehensive, end-to-end solutions that not only capture but also destroy contaminants to prevent them from re-entering the environment.

As a cost-effective and efficient solution for municipal and industrial users, SafeGuard™ H2O removes inorganics, organics, and metals from water and wastewater. This revolutionary system reduces the need for bulk toxic chemicals.  The fully automated SafeGuard™ H2O technology produces a non-toxic ferrous reagent onsite and on demand using an in-situ electrolytic generator and a certified precursor. It operates on low power electricity from renewable sources.

The fully automated SafeGuard™ H2O technology produces a non-toxic stannous reagent onsite and on demand using an in-situ electrolytic generator and a certified precursor. As a cost-effective and efficient solution for municipal and industrial users, SafeGuard™ H2O removes Cr(VI), Fe, H2S, Hg, Pb, and Se from water and wastewater. It also acts as an antibiofilm, antimicrobial reagent for produced water, and as a corrosion inhibitor in distribution networks and cooling systems.

In this episode of AMS Talks, Industry Consultant Nadia Abboud speaks with AMS Senior Product Manager Vladimir Dozortsev, Ph.D., about the evolution of the SafeGuard™ H2O technology into new markets and applications by expanding into the on-site generation of a strong iron-based oxidizing reagent. The reagent can be used to treat a range of contaminants across municipal and industrial applications, including food and beverage, mining, oil and gas, pharmaceutical, and semiconductor. SafeGuard™ H2O provides sustainable, cost-effective and reliable water and wastewater treatment for facilities seeking environmentally friendly solutions that also reduce their reliance on bulk chemicals.

In the fight to keep water safe and affordable, there is only one technology for the job! SafeGuard™ H2O is a fully automated, on-demand, in-situ generator of stannous (reducing agent) and tin dioxide (adsorbent), coupled with online monitoring capability. SafeGuard H2O removes As, Cr(VI), Cu, Fe, Pb, and Mn from drinking water and As, Cr(VI), Hg & Se from wastewater; acts as corrosion inhibitor for lead pipes and cooling systems; adsorbs SO2, H2S from industrial emissions. Tin and electricity are the only consumables. There are no similar technologies to SafeGuard H2O that integrate a low life-time cost contaminant treatment system with real-time performance controls. With SafeGuard H2O, contaminants have met their match!

Semiconductor manufacturing is not only highly dependent on large volumes of water that must be treated to ultrapure standards, but the process also generates significant volumes of wastewater that contains heavy metals and toxic solvents. To reduce its environmental impact, the semiconductor industry is actively searching for new ways to optimize water consumption and improve the quality of wastewater effluent. AMS offers innovative online real-time, continuous trace metals monitoring solutions designed to aid the semiconductor industry in optimizing water consumption, improving the quality of wastewater effluent and reducing its environmental impact.

In this episode of AMS Talks, Rick Bacon, CEO of AMS, discusses innovations in arsenic removal treatment technologies and why it might be time to implement a more stringent federal standard for this carcinogenic contaminant than the 10 ppb limit set by the EPA in 2001.

TRUMPF, a manufacturer of laser diodes made from Gallium Arsenide substrates (GaAs) wafers, implemented a new wafer thinning process in 2019. With large volumes of process wastewater and high treatment costs, TRUMPF needed a practical, cost-effective wafer-thinning wastewater treatment process that would also allow them to meet local regulatory discharge requirements. TRUMPF undertook a treatment approach that included the installation of the MetalGuard™ Arsenic online arsenic analyzer to continuously measure influent and effluent arsenic levels in real-time, providing TRUMPF with accurate and reliable results in less than 30 minutes to measure the performance of its IEX system and ensure regulatory compliance. The wastewater treatment approach undertaken by TRUMPF resulted in process improvements, providing an estimated annual cost savings of more than $150K with an ROI of less than one year.

The semiconductor industry has found that traditional analytical methods for complexed copper in wastewater are not fit for purpose since complexed copper cannot be accurately measured using ion-selective electrodes and colorimetry technology, while accurate, has significant challenges. Given these challenges, Samsung Austin Semiconductor (SAS) evaluated the MetalGuard™ analyzer’s performance and ability to significantly improve the safety and quality of measurements for copper wastewater streams.