TRUMPF, a manufacturer of laser diodes made from Gallium Arsenide substrates (GaAs) wafers, implemented a new wafer thinning process in 2019. With large volumes of process wastewater and high treatment costs, TRUMPF needed a practical, cost-effective wafer-thinning wastewater treatment process that would also allow them to meet local regulatory discharge requirements. TRUMPF undertook a treatment approach that included the installation of the MetalGuard™ Arsenic online arsenic analyzer to continuously measure influent and effluent arsenic levels in real-time, providing TRUMPF with accurate and reliable results in less than 30 minutes to measure the performance of its IEX system and ensure regulatory compliance. The wastewater treatment approach undertaken by TRUMPF resulted in process improvements, providing an estimated annual cost savings of more than $150K with an ROI of less than one year.